SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Three-dimensional physical photoresist model calibration and profile-based pattern verification
Talbi, Mohamed, Dusa, Mircea V., Conley, Will, Abdo, Amr Y., Bailey, Todd C., Conley, Will, Dunn, Derren N., Fujimoto, Masashi, Nickel, John, Chung, No Young, Marokkey, Sajan, Lee, Si Hyeung, Sarma, CVolume:
7640
Année:
2010
Langue:
english
DOI:
10.1117/12.846466
Fichier:
PDF, 1.67 MB
english, 2010
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