SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Simulation of 193-nm photoresists based on different polymer platforms
Kang, Doris, Robertson, Stewart A., Pavelchek, Edward K., Houlihan, Francis M.Volume:
4345
Année:
2001
Langue:
english
DOI:
10.1117/12.436818
Fichier:
PDF, 230 KB
english, 2001
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