SPIE Proceedings [SPIE ISMA '97 International Symposium on Microelectronics and Assembly - Singapore, Singapore (Monday 23 June 1997)] Microlithographic Techniques in IC Fabrication - Enhanced poly gate critical dimension control by using a SiOxNy ARC film
Bencher, Christopher, Chu, Tony, Tan, Way Tat, Zou, Gang, Lin, Qunying, Yi, Xu, Dong, Wang Xu, Wen, Ma Wei, Yoon, Soon Fatt, Yu, Raymond, Mack, Chris A.Volume:
3183
Année:
1997
Langue:
english
DOI:
10.1117/12.280548
Fichier:
PDF, 1.21 MB
english, 1997