An advanced tunnel oxide layer process for 65 nm NOR floating-gate flash memories
Chiu, Shengfen, Xu, Yue, Ji, Xiaoli, Liao, Yiming, Wu, Fuwei, Yan, FengVolume:
30
Langue:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/30/10/105032
Date:
October, 2015
Fichier:
PDF, 1.10 MB
english, 2015