SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Electron-beam lithography method for sub-50-nm isolated trench with high aspect ratio
Yang, XiaoMin, Eckert, Andrew R., Mountfield, Keith, Gentile, Harold, Seiler, Carl, Brankovic, Stanko, Harris, Robert, Johns, Earl, Engelstad, Roxann L.Volume:
5037
Année:
2003
Langue:
english
DOI:
10.1117/12.482343
Fichier:
PDF, 1.01 MB
english, 2003
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