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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Planarizing BARC 0.32-μm i-line lithography process for the reduction of intradie CD variation
Johnson, Jeffrey R., Davis, Audrey M., Bair, Andrew E., Nunan, Peter D., Spinner III, Charles R., Spak, Mark A., Dammel, Ralph R., Fuller, Gene E.Volume:
3051
Année:
1997
Langue:
english
DOI:
10.1117/12.276019
Fichier:
PDF, 1.60 MB
english, 1997