
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - Interlayer design verification methodology using contour image
Capodieci, Luigi, Cain, Jason P., Shim, Minyoung, Kim, Seoksan, Park, Sungmin, Choi, Seiryung, Kang, Namjung, Sung, Hyunju, Choi, Jinwoo, Shin, Jaepil, Park, Jaekyun, Shim, Myoungseob, Hong, HyeongsunVolume:
9781
Année:
2016
Langue:
english
DOI:
10.1117/12.2218477
Fichier:
PDF, 3.92 MB
english, 2016