SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Bake mechanisms in novolak-based photoresist films: investigation by contact angle measurements
Fadda, Emilienne, Clarisse, C., Paniez, Patrick J., Kunz, Roderick R.Volume:
2724
Année:
1996
Langue:
english
DOI:
10.1117/12.241844
Fichier:
PDF, 230 KB
english, 1996