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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Effect of using a resin coating on KrF chemically amplified positive resists
Oikawa, Akira, Santoh, Nobuaki, Miyata, Shuichi, Hatakenaka, Yasunori, Tanaka, Hiroyuki, Nakagawa, Kenji, Hinsberg, William D.Volume:
1925
Année:
1993
Langue:
english
DOI:
10.1117/12.154809
Fichier:
PDF, 544 KB
english, 1993