SPIE Proceedings [SPIE 26th European Mask and Lithography Conference - Grenoble, France (Monday 18 January 2010)] 26th European Mask and Lithography Conference - Projection mask-less lithography and nanopatterning with electron and ion multi-beams
Klein, Christof, Behringer, Uwe F.W., Maurer, Wilhelm, Platzgummer, Elmar, Loeschner, HansVolume:
7545
Année:
2010
Langue:
english
DOI:
10.1117/12.863143
Fichier:
PDF, 4.77 MB
english, 2010