SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Application of DBM tool for detection of EUV mask defect
Yoo, Gyun, Kim, Jungchan, Park, Chanha, Lee, Taehyeong, Ji, Sunkeun, Yang, Hyunjo, Yim, Donggyu, Park, Byeongjun, Maruyama, Kotaro, Yamamoto, Masahiro, Starikov, Alexander, Cain, Jason P.Volume:
8681
Année:
2013
Langue:
english
DOI:
10.1117/12.2011476
Fichier:
PDF, 703 KB
english, 2013