SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Approximation of in-resist image by aerial image with 1/n-times shorter wavelength
Nakao, Shuji, Smith, Bruce W., Abe, Jun, Okagawa, Takashi, Imai, Akira, Kozawa, Hidehiko, Tokui, Akira, Tsujita, KouichirouVolume:
5377
Année:
2004
Langue:
english
DOI:
10.1117/12.533368
Fichier:
PDF, 482 KB
english, 2004