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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Statistical measure for the sharpness of SEM images
Zhang, Nien-Fan, Postek, Jr., Michael T., Larrabee, Robert D., Vladar, Andras E., Keery, William J., Jones, Samuel N., Jones, Susan K.Volume:
3050
Année:
1997
Langue:
english
DOI:
10.1117/12.275935
Fichier:
PDF, 1.13 MB
english, 1997