Electron multibeam technology for mask and wafer writing at 0.1 nm address grid
Platzgummer, Elmar, Klein, Christof, Loeschner, HansVolume:
12
Langue:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.jmm.12.3.031108
Date:
August, 2013
Fichier:
PDF, 6.54 MB
english, 2013