SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Increased uniformity control in a 45nm polysilicon gate etch process
Parkinson, Blake, Allgair, John A., Raymond, Christopher J., Prager, Dan, Funk, Merritt, Sundararajan, Radha, Yamashita, Asao, Bandy, Kenneth, Meyette, EricVolume:
7272
Année:
2009
Langue:
english
DOI:
10.1117/12.816095
Fichier:
PDF, 694 KB
english, 2009