SPIE Proceedings [SPIE 19th European Conference on Mask Technology for Integrated Circuits and Microcomponts - Sonthofen, Germany (Monday 13 January 2003)] 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool
Scheuring, Gerd, Petrashenko, Alexander, Doebereiner, Stefan, Hillmann, Frank, Bruck, Hans-Jurgen, Hourd, Andrew C., Grimshaw, Anthony, Hughes, Gordon, Chen, Shiuh-Bin, Chen, Parkson W., Schatz, ThomaVolume:
5148
Année:
2003
Langue:
english
DOI:
10.1117/12.515107
Fichier:
PDF, 883 KB
english, 2003
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