SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Subwavelength alignment mark signal analysis of advanced memory products
Yin, Xiaoming, Wong, Alfred K. K., Wheeler, Donald C., Williams, Gary, Lehner, Eric A., Zach, Franz X., Kim, Byeong Y., Fukuzaki, Yuzo, Lu, Zhijian G., Credendino, Santo, Wiltshire, Timothy J., SullivVolume:
3998
Année:
2000
Langue:
english
DOI:
10.1117/12.386501
Fichier:
PDF, 801 KB
english, 2000
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