SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Optimal mask characterization by Surrogate Wafer Print (SWaP) method
Kimmel, Kurt R., Kawahira, Hiroichi, Zurbrick, Larry S., Hoellein, Ingo, Peters, Jan Hendrick, Ackmann, Paul, Connolly, Brid, West, CraigVolume:
7122
Année:
2008
Langue:
english
DOI:
10.1117/12.801685
Fichier:
PDF, 297 KB
english, 2008