SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Dark field Double Dipole Lithography (DDL) for 45nm node and beyond
Hsu, Stephen, Hoga, Morihisa, Burkhardt, Martin, Park, Jungchul, Van Den Broeke, Douglas, Chen, J. FungVolume:
6283
Année:
2006
Langue:
english
DOI:
10.1117/12.681854
Fichier:
PDF, 784 KB
english, 2006