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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Lithographic process window optimization for mask aligner proximity lithography
Lai, Kafai, Erdmann, Andreas, Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna, Erdmann, Andreas, Ünal, Nezih, Hofmann, Ulrich, Hennemeyer, Marc, Zoberbier, Ralph, Nguyen, David, Brugger, JuergenVolume:
9052
Année:
2014
Langue:
english
DOI:
10.1117/12.2046332
Fichier:
PDF, 1.01 MB
english, 2014