SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Litho process control via optimum metrology sampling while providing cycle time reduction and faster metrology-to-litho turn around time
Raymond, Christopher J., Chen, K.-H., Huang, Jacky, Yang, W.-T., Ke, C.-M., Ku, Y.-C., Lin, John, Bhattacharyya, Kaustuve, Mos, Evert, Shahrjerdy, Mir, van der Schaar, Maurits, Meyer, Steffen, Lin, SpVolume:
7971
Année:
2011
Langue:
english
DOI:
10.1117/12.879218
Fichier:
PDF, 321 KB
english, 2011
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