SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Minimizing yield-loss risks through post-OPC verification
Wang, Ching-Heng, Martin, Patrick M., Naber, Robert J., Liu, Qingwei, Zhang, Liguo, Gao, Gen-Sheng, Brist, Travis E., Donnelly, Tom, Shang, ShumayVolume:
6349
Année:
2006
Langue:
english
DOI:
10.1117/12.686585
Fichier:
PDF, 293 KB
english, 2006