SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Top coat or no top coat for immersion lithography?
Stepanenko, N., Lin, Qinghuang, Kim, Hyun-Woo, Kishimura, S., Van Den Heuvel, D., Vandenbroeck, N., Kocsis, M., Foubert, P., Maenhoudt, M., Ercken, M., Van Roey, F., Gronheid, R., Pollentier, I., VangVolume:
6153
Année:
2006
Langue:
english
DOI:
10.1117/12.660158
Fichier:
PDF, 498 KB
english, 2006
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