SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - EUV OPC for 56nm metal pitch
Burkhardt, Martin, La Fontaine, Bruno M., Naulleau, Patrick P., Colburn, Matt, Deng, Yunfei, Gallagher, Emily, Kato, Hirokazu, McIntyre, Greg, Petrillo, Karen, Raghunathan, Sudhar, Smith, Adam C., WalVolume:
7969
Année:
2011
Langue:
english
DOI:
10.1117/12.879931
Fichier:
PDF, 2.58 MB
english, 2011
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