SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning
Hohle, Christoph K., Younkin, Todd R., Pfirrmann, Stefan, Kirchner, Robert, Lohse, Olga, Guzenko, Vitaliy A., Voigt, Anja, Harder, Irina, Kolander, Anett, Schift, Helmut, Grützner, GabiVolume:
9779
Année:
2016
Langue:
english
DOI:
10.1117/12.2219165
Fichier:
PDF, 4.21 MB
english, 2016