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Gas-temperature control in VHF- PECVD process for high-rate (>5 nm/s) growth of microcrystalline silicon thin films
Yasushi Sobajima, Takuya Higuchi, Jakapan Chantana, Toshihiko Toyama, Chitose Sada, Akihisa Matsuda, Hiroaki OkamotoVolume:
7
Année:
2010
Langue:
english
Pages:
1
DOI:
10.1002/pssc.200982711
Fichier:
PDF, 207 KB
english, 2010