SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Automated optimized overlay sampling for high-order processing in double patterning lithography
Koay, Chiew-seng, Raymond, Christopher J., Colburn, Matthew E., Izikson, Pavel, Robinson, John C., Kato, Cindy, Kurita, Hiroyuki, Nagaswami, VenkatVolume:
7638
Année:
2010
Langue:
english
DOI:
10.1117/12.846371
Fichier:
PDF, 561 KB
english, 2010