SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Extendibility of chemically amplified resists: another brick wall?
Hinsberg, William D., Houle, Frances A., Sanchez, Martha I., Hoffnagle, John A., Wallraff, Gregory M., Medeiros, David R., Gallatin, Gregg M., Cobb, Jonathan L., Fedynyshyn, Theodore H.Volume:
5039
Année:
2003
Langue:
english
DOI:
10.1117/12.487739
Fichier:
PDF, 1.12 MB
english, 2003
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