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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Emerging Lithographic Technologies - Impact of the Coulomb interaction effect on delineating densely repeated 0.1-μm patterns using electron-beam block exposure
Takahashi, Kimitoshi, Yamazaki, Satoru, Ohno, Manabu, Watanabe, Hitoshi, Sakakibara, Takayuki, Satoh, Masami, Nagata, Takeo, Yamada, Akio, Yasuda, Hiroshi, Nara, Yasuo, Sasaki, Nobuo, Seeger, David E.Volume:
3048
Année:
1997
Langue:
english
DOI:
10.1117/12.275768
Fichier:
PDF, 458 KB
english, 1997