SPIE Proceedings [SPIE Symposium on Photomask and X-Ray Mask Technology - Kawasaki City, Japan (Thursday 18 April 1996)] Photomask and X-Ray Mask Technology III - Mask technology for 0.18-μm device generation
Sohn, Jung-Min, Choi, Seong-Woon, Kim, Byung G., Cho, Hanku, Yoon, Hee-Sun, Yoshihara, HideoVolume:
2793
Année:
1996
Langue:
english
DOI:
10.1117/12.245234
Fichier:
PDF, 601 KB
english, 1996