SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Critical process parameters of an acetal-based deep-UV photoresist
Roeschert, Horst, Przybilla, Klaus J., Spiess, Walter, Wengenroth, Horst, Pawlowski, Georg, Novembre, Anthony E.Volume:
1672
Année:
1992
Langue:
english
DOI:
10.1117/12.59724
Fichier:
PDF, 960 KB
english, 1992