SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Design and properties of new deep-UV positive photoresist
Choi, Sang-Jun, Jung, Si-Young, Kim, Chang-Hwan, Park, Choon-Geun, Han, Woo-Sung, Koh, Young-Bum, Lee, Moon-Yong, Kunz, Roderick R.Volume:
2724
Année:
1996
Langue:
english
DOI:
10.1117/12.241831
Fichier:
PDF, 288 KB
english, 1996