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SPIE Proceedings [SPIE Optomechatronic Technologies 2005 - Sapporo, Japan (Monday 5 December 2005)] Optomechatronic Micro/Nano Devices and Components - SiO2 etching for optical device using pulse-modulated electron-beam-excited plasma
Ohta, Takayuki, Ito, Masafumi, Takeda, Keigo, Hori, Masaru, Katagiri, YoshitadaVolume:
6050
Année:
2005
Langue:
english
DOI:
10.1117/12.648628
Fichier:
PDF, 1.33 MB
english, 2005