SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Positive and negative tone double patterning lithography for 50nm flash memory
Lim, Chang-Moon, Flagello, Donis G., Kim, Seo-Min, Hwang, Young-Sun, Choi, Jae-Seung, Ban, Keun-Do, Cho, Sung-Yoon, Jung, Jin-Ki, Kang, Eung-Kil, Lim, Hee-Youl, Kim, Hyeong-Soo, Moon, Seung-ChanVolume:
6154
Année:
2006
Langue:
english
DOI:
10.1117/12.656187
Fichier:
PDF, 529 KB
english, 2006