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[IEEE 2016 Pan Pacific Microelectronics Symposium (Pan Pacific) - Big Island, HI, USA (2016.1.25-2016.1.28)] 2016 Pan Pacific Microelectronics Symposium (Pan Pacific) - Development status of photoresist as mask material for Injection Molded Solder (IMS) technique
Hasegawa, Koichi, Mukawa, Jun, Takahashi, Seiichirou, Kobata, Chihiro, Ohkita, Kenzo, Kusumoto, Shiro, Aoki, Toyohiro, Nakamura, Eiji, Hisada, Takashi, Mori, Hiroyuki, Orii, YasumitsuAnnée:
2016
Langue:
english
DOI:
10.1109/PanPacific.2016.7428428
Fichier:
PDF, 1.45 MB
english, 2016