
Creation process of thermally induced defects in boron-doped hydrogenated amorphous silicon-carbon films
Chen, Guanghua, Song, Zhizhong, Zhao, Liming, Guo, Yongping, Zhang, FangqingVolume:
67
Langue:
english
Journal:
Philosophical Magazine Part B
DOI:
10.1080/13642819308207690
Date:
April, 1993
Fichier:
PDF, 541 KB
english, 1993