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Novel etch process to tune crater size on magnetron sputtered ZnO:Al
Jorj I. Owen, Jürgen Hüpkes, Hongbing Zhu, Eerke Bunte, Sascha E. PustVolume:
208
Année:
2011
Langue:
english
Pages:
5
DOI:
10.1002/pssa.201026164
Fichier:
PDF, 558 KB
english, 2011