Negative-working photoresist based on a first-generation dendrimer consisting of 4,4-diphenylpentyloxy units
Yasushi Kamimura, Osamu Haba, Takeshi Endo, Mitsuru UedaVolume:
43
Année:
2005
Langue:
english
Pages:
6
DOI:
10.1002/pola.20608
Fichier:
PDF, 186 KB
english, 2005