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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Split and design guidelines for double patterning
Wiaux, Vincent, Verhaegen, Staf, Cheng, Shaunee, Iwamoto, Fumio, Jaenen, Patrick, Maenhoudt, Mireille, Matsuda, Takashi, Postnikov, Sergei, Vandenberghe, GeertVolume:
6924
Année:
2008
Langue:
english
DOI:
10.1117/12.774104
Fichier:
PDF, 1.35 MB
english, 2008