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Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions
George, Steven M., Lee, YoungheeVolume:
10
Langue:
english
Journal:
ACS Nano
DOI:
10.1021/acsnano.6b02991
Date:
May, 2016
Fichier:
PDF, 714 KB
english, 2016