A Detailed Study of Void Motion In Passivated Aluminum Interconnects
Doan, Jonathan C., Bravman, John C., Flinn, Paul A., Marieb, Thomas N.Volume:
563
Langue:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-563-103
Date:
January, 1999
Fichier:
PDF, 1.58 MB
english, 1999