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Characterization of Residual Stress in a-SiC:H Deposited by RF-PECVD for Manufacturing of Membranes for Cell Culture
Gelvez- Lizarazo, O., Reyes-Betanzo, C.Volume:
1812
Année:
2016
Langue:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2016.27
Fichier:
PDF, 724 KB
english, 2016