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The Effect of Hydrogen Incorporation on the Performance of Nanocrystalline Silicon Thin Film Transistors Fabricated by Microwave ECR Plasma CVD
Teng, Lihong, Anderson, Wayne A.Volume:
737
Langue:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-737-f3.38
Date:
January, 2002
Fichier:
PDF, 410 KB
english, 2002