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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Process window variation comparison between NTD and PTD for various contact type
Erdmann, Andreas, Kye, Jongwook, Kim, Doyoun, Yune, Hyoungsoon, Park, Daejin, Jeong, Joohong, Moon, Woosung, Kim, Mingu, Oh, Seyoung, Park, Chanha, Yang, HyunjoVolume:
9780
Année:
2016
Langue:
english
DOI:
10.1117/12.2218858
Fichier:
PDF, 978 KB
english, 2016