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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Implementation of KrF DBARCs for implant applications on advanced lithography nodes
Lowes, Joyce, Allen, Robert D., Somervell, Mark H., Guerrero, Alice, Weigand, Michael, Washburn, Carlton, Stroud, Charlyn, Sharma, Shalini, Torres, David, Slezak, Mark, Dabbagh, Gary, Tang, CherryVolume:
7972
Année:
2011
Langue:
english
DOI:
10.1117/12.879464
Fichier:
PDF, 1.50 MB
english, 2011