SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening
Hayashi, Naoya, Kasprowicz, Bryan S., Choi, Jaehyuck, Kim, Jinsu, Lowe, Jeff, Dattilo, Davide, Koh, Soowan, Choi, Jun Yeol, Dietze, Uwe, Shoki, Tsutomu, Kim, Byung Gook, Jeon, Chan-UkVolume:
9635
Année:
2015
Langue:
english
DOI:
10.1117/12.2197226
Fichier:
PDF, 1.85 MB
english, 2015