SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Improving focus performance at litho using diffraction-based focus metrology, novel calibration methods, interface and control loop
Sanchez, Martha I., Ukraintsev, Vladimir A., Hu, Jiarui, Chen, Y. L., Chen, K. H., Lee, Brian, Tsai, Frankie, Ke, C. M., Liao, C. H., Ngo, Desmond, Gosali, Benny, Tijssen, Robin, Huang, Vincent, Tu, WVolume:
9778
Année:
2016
Langue:
english
DOI:
10.1117/12.2220373
Fichier:
PDF, 1.08 MB
english, 2016
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