SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - A single-nanometer nanoimprint-mask fabrication by EB lithography followed by nanoimprinting and self-aligned double-patterning
Resnick, Douglas J., Bencher, Christopher, Kobayashi, Hideo, Suzuki, Kouta, Iyama, Hiromasa, Kishimoto, Shuji, Kagatsume, Takeshi, Sato, Takashi, Watanabe, TsuyoshiVolume:
9049
Année:
2014
Langue:
english
DOI:
10.1117/12.2050012
Fichier:
PDF, 1.36 MB
english, 2014