SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Method of ellipsometric characterization of the resist and DBARC interface
Reilly, Michael, Allen, Robert D., Somervell, Mark H., Cameron, James F., Wong, Sabrina, Ware, AdamVolume:
7972
Année:
2011
Langue:
english
DOI:
10.1117/12.880982
Fichier:
PDF, 526 KB
english, 2011