SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Negative-tone imaging (NTI) at the 22nm node: process and material development
Cantone, Jason, Allen, Robert D., Somervell, Mark H., Petrillo, Karen, Xu, Yongan, Landie, Guillaume, Kawakami, Shinichiro, Dunn, Shannon, Colburn, MattVolume:
7972
Année:
2011
Langue:
english
DOI:
10.1117/12.879719
Fichier:
PDF, 1.57 MB
english, 2011
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